• The equipment allows measurements covering the entire spectral range from UV to NIR that are accomplished in seconds, thus being suitable for a large range of applications, including dielectric, organic thin layers and amorphous semiconductors characterization. The M-2000 Ellipsometer uses a CCD detector for simultaneous measurement of hundreds of wavelengths.
  • The equipment incorporates the rotating compensator technology (RCE), thus facilitating: a high accuracy on any sample; measurement of full range of Psi (0 to 90°) and Delta (0° to 360°); determination of depolarization and measurement of more elements of the Mueller-matrix. The available software packages allow fast and reliable data acquisition, data analysis, optical simulations and routine calibrations.
  • Thin layer thickness and optical constants are mainly determined involving ellipsometry.