• The most powerful excimer laser in UV range.
  • Two working gas mixtures ArF (λ=193 nm) and KrF (λ=248 nm)
  • Pulse repetition rate from 1 to 50 Hz
  • Maximum energy/pulse 700mJ and pulse duration is 20 ns.
  • Max power/pulse = 35 MWatt
  • The equipment is used for laser ablation in UHV (10-10 Torr) as well as for carbon nanomaterials synthesis such as: Single Wall Carbon Nanotubes, Nano-onions, Graphene in a home made reactor.


Ablation of a graphite target