Ultra High Vacuum chamber for Pulsed Laser Deposition. The pressure in the chamber can go to 2*10-10Torr ensuring that the plasma produced by the laser ablation can expand uniformly.

Center for Surface Science and Nanotechnology University POLITEHNICA of Bucharest
Ultra High Vacuum chamber for Pulsed Laser Deposition. The pressure in the chamber can go to 2*10-10Torr ensuring that the plasma produced by the laser ablation can expand uniformly.