Ultra High Vacuum chamber for Pulsed Laser Deposition. The pressure in the chamber can go to 2*10-10Torr ensuring that the plasma produced by the laser ablation can expand uniformly.
- About
- Services
- „Products”
- Projects
- Jobs
- Laboratories
- Advanced Electronic Microscopy
- Advanced Atomic Force Microscopy
- Micro-Raman, nano-optics and nano-spectroscopy
- Structural and Chemical Characterization
- Mass Spectrometry
- Spectroscopy
- Electrochemical micro- and nanostructured coatings
- Thin Films
- Micro and Nanolithography
- Electrical, Optical and Magnetic measurements at low temperature
- Solar cells, MEMS and chip evaluation and testing
- Carbon based nanomaterials synthesis
- Specimens Preparation
- CSSNT Events
- Contact
- English